Chakra™ is engineered to actively participate in the planarization reaction itself. When paired with ChEmpower's chemical polishing fluid, Chakra™ enables abrasive-free planarization, removing ...
Dow Unveils First CMP Polishing Pads from its IKONIC™ Platform; Brings New, Advanced Materials to th
PHILADELPHIA--(BUSINESS WIRE)-- Following the introduction of its IKONIC™ chemical mechanical planarization (CMP) polishing pad platform in late 2012, Dow Electronic Materials, a business unit of The ...
PHILADELPHIA--(BUSINESS WIRE)--Dow Electronic Materials, a business unit of The Dow Chemical Company (NYSE:DOW), today introduced its new IKONIC™ polishing pad platform, bringing to market Dow’s most ...
ChEmpower Corp., a semiconductor materials company that develops polishing pads and chemical solutions, today announced Chakra, its first product designed to improve efficiency, reduce costs and ...
Dow Electronic Materials, a unit of U.S. chemical kingpin The Dow Chemical Company ( DOW), has launched the first chemical mechanical planarization (CMP) polishing pads from its new IKONIC 2000 and ...
AURORA, Ill., Oct. 20, 2010 (GLOBE NEWSWIRE) -- Cabot Microelectronics Corporation (Nasdaq:CCMP), the world's leading supplier of chemical mechanical planarization (CMP) polishing slurries and growing ...
CMP is an integral part of the semiconductor chip manufacturing process enhancement process. Since the concept of CMP polishing applications was introduced by Walsh et al. in 1965, CMP process ...
Fujifilm is expanding its chemical-mechanical planarization (CMP) polishing agent production in Japan to meet the rising demand for AI chips in Asia. This expansion will increase production by 30% and ...
Dow Electronic Materials, a unit of U.S. chemical kingpin The Dow Chemical Company (DOW), has launched the first chemical mechanical planarization (CMP) polishing pads from its new IKONIC 2000 and ...
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